Spin Type Cleaning System WULF series for high definition photomasks
Equipped with a spin cleaning unit that uses tap water. This method utilizes a cleaning solution that replaces the RCA cleaning solution.
Our group company's cleaning system contributes to high purity and yields improvement in photomask/reticle products. We will cooperate with manufacturers to improve their production capability. 【Features】 ・Contributes to high purity and yields process improvement ・Removes organic matter, metal ions, and foreign matter, which may no longer be detectable ・Environmentally friendly tool removes impure deposits on work surface quickly and is environmentally safe for liquid waste management ・Utilizes a cleaning solution and cleaning method that replaces the RCA cleaning solution. ・Equipped with a spin cleaning unit that uses regular water. ・High-speed diffusion of washing liquid to the cleaning surface ・Dries without watermark deposits 【Applications】 ・Product cleaning for photomask/reticle/mask blank manufacturers ・Reticle cleaning before exposure to semiconductor device manufacturers ・Product cleaning in a semiconductor device manufacturer's in-house mask line (mask shop) 【Delivery record】 ・Domestic and overseas mask blanks, photomasks, and reticle manufacturers ・Domestic and overseas device manufacturers *For more details, please contact us or download and view the catalog.
- Company：M.WATANABE & CO.,LTD.
- Price：Other
